[P-1-23L] Momentum Transfer Implantation for Sidewall Doping of FinFET's

G. Fuse¹、M. Sugitani¹、H. Matsushita¹、H. Murooka¹、M. Kuriyama²、M. Tanaka² (1.SEN corporation、2.Sumitomo Heavy Industry , Japan)

https://doi.org/10.7567/SSDM.2010.P-1-23L