2010 International Conference on Solid State Devices and Materials

Sep 21, 2010 - Sep 24, 2010
The University of Tokyo, Tokyo, Japan

[P-2-7] Numerical Simulation of Organic Low-k Etching in H₂/N₂ Plasma

T. Yagisawa¹, T. Makabe¹ (1.Keio Univ. , Japan)

https://doi.org/10.7567/SSDM.2010.P-2-7

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