The Japan Society of Applied Physics

[P-3-12] Development of a Multi-Scale Time Dependent Dielectric Breakdown Simulator Based on TBQC and KMC Method: Application to the Evaluation of a Gate Oxide Film for CMOS Technology

H. Tsuboi1, K. Inaba1, Y. Hayashi1, H. Sato1, Y. Obara1, Y. Suzuki1, T. Miyagawa1, S. Nakamura1, R. Nagumo1, R. Miura1, A. Suzuki1, N. Hatakeyama1, A. Endou1, H. Takaba1, M. Kubo1, A. Miyamoto1 (1.Tohoku Univ. , Japan)

https://doi.org/10.7567/SSDM.2010.P-3-12