Low-Frequency Noise Behavior of La-Doped Hf-Based Dielectric nMOSFETs

2010 International Conference on Solid State Devices and Materials

Sep 21, 2010 - Sep 24, 2010
The University of Tokyo, Tokyo, Japan

D. Y. Choi¹, C. W. Sohn¹, H. C. Sagong¹, M. S. Park¹, K. T. Lee¹, R. H. Baek¹, C. Y. Kang², Y. H. Jeong¹ (1.POSTECH , Korea, 2.SEMATECH , USA)