[P-3-19] Investigation of Illuminated High-Frequency Capacitance-Voltage Response in Deep Depletion of HfO₂ and SiO₂ MOS Capacitors with Ultra-thin Gate Oxides

J. Y. Cheng¹、J. G. Hwu¹ (1.National Taiwan Univ. , Taiwan)

https://doi.org/10.7567/SSDM.2010.P-3-19