[P-6-1] Characterization of SiGe Thin Films Deposited by RF Magnetron Sputtering for Infrared Imaging Sensor

K. Yamaki¹、S. Sekino²、T. Tai¹、S. Nakamura²、T. Yoshitake²、A. Furukawa¹ (1.Tokyo Univ. of Sci.、2.NEC Corp. , Japan)

https://doi.org/10.7567/SSDM.2010.P-6-1