[P-7-4] Dry Etching of Al-rich AlxGa1-xAs Holes with High Aspect Ratio for Photonic Crystal Fabrication
M. Mochizuki1, T. Nakajima1, D. Satoi1, F. Ishikawa1, M. Kondow1, M. Hara1, H. Aoki1
(1.Osaka Univ. , Japan)
https://doi.org/10.7567/SSDM.2010.P-7-4