[P-7-4] Dry Etching of Al-rich Al_xGa_1-xAs Holes with High Aspect Ratio for Photonic Crystal Fabrication

M. Mochizuki¹、T. Nakajima¹、D. Satoi¹、F. Ishikawa¹、M. Kondow¹、M. Hara¹、H. Aoki¹ (1.Osaka Univ. , Japan)

https://doi.org/10.7567/SSDM.2010.P-7-4