[A-8-4] Damage-free GaN Etching by Chlorine Neutral Beam Y. Tamura1,3, X.Y. Wang1,3, C.H. Huang1,3, T. Kubota1, J. Ohta2, H. Fujioka2,3, S. Samukawa1,3 (1.Tohoku Univ., 2.Univ. of Tokyo, 3.CREST-JST , Japan) https://doi.org/10.7567/SSDM.2011.A-8-4