[A-8-4] Damage-free GaN Etching by Chlorine Neutral Beam

Y. Tamura^1,3、X.Y. Wang^1,3、C.H. Huang^1,3、T. Kubota¹、J. Ohta²、H. Fujioka^2,3、S. Samukawa^1,3 (1.Tohoku Univ.、2.Univ. of Tokyo、3.CREST-JST , Japan)

https://doi.org/10.7567/SSDM.2011.A-8-4