[C-3-1] Improvement of thermal stability in High Density Ta2O5 3D capacitor by additional thin SiO2 layer
M. Detalle1, H. Dekkers1, G. Potoms1, A. Phommahaxay1, D. S. Tezcan1, P. Soussan1, G. Beyer1
(1.IMEC , Belgium)
https://doi.org/10.7567/SSDM.2011.C-3-1