[C-3-1] Improvement of thermal stability in High Density Ta₂O₅ 3D capacitor by additional thin SiO₂ layer

M. Detalle¹、H. Dekkers¹、G. Potoms¹、A. Phommahaxay¹、D. S. Tezcan¹、P. Soussan¹、G. Beyer¹ (1.IMEC , Belgium)

https://doi.org/10.7567/SSDM.2011.C-3-1