[C-4-3] Nano-scale Boron Mapping in Silicon Devices Using C_s-corrected STEM-EELS

N. Nakanishi¹, H. Arie¹, Y. Kunimune¹, T. Ide¹, Y. Hirose¹, N. Hattori¹, T. Koyama¹ (1.Renesas Electronics Corp. , Japan)

https://doi.org/10.7567/SSDM.2011.C-4-3