[C-9-1] In Situ Analysis of Plasma-Induced Modification on Porous SiOCH Films

H. Yamamoto¹, K. Asano¹, K. Ishikawa¹, K. Takeda¹, H. Kondo¹, M. Sekine¹, M. Hori¹ (1.Nagoya Univ. , Japan)

https://doi.org/10.7567/SSDM.2011.C-9-1