[D-2-2] Experimental Study of Si Monolayers for Future Extremely-Thin SOIs (ETSOIs): Phonon Confinement Effects and Strain due to Si Bending

T. Mizuno¹、K. Tobe¹、Y. Maruyama¹、T. Sameshima² (1.Kanagawa Univ.、2.Tokyo Univ. of Agri. and Tech. , Japan)

https://doi.org/10.7567/SSDM.2011.D-2-2