Experimental Study of Si Monolayers for Future Extremely-Thin SOIs (ETSOIs): Phonon Confinement Effects and Strain due to Si Bending

2011 International Conference on Solid State Devices and Materials

Sep 27, 2011 - Sep 30, 2011
Aichi Industry & Labor Center (WINC AICHI), Nagoya, Japan

T. Mizuno¹, K. Tobe¹, Y. Maruyama¹, T. Sameshima² (1.Kanagawa Univ., 2.Tokyo Univ. of Agri. and Tech. , Japan)