Soft X-ray Photoelectron Spectroscopy on Chemical Bonding States of Boron Doped in Si Fin Structures

Y. Miyata; J. Kanehara; H. Nohira; Y. Izumi; T. Muro; T. Kinoshita; P. Ahmet; K. Kakushima; K. Tsutsui; T. Hattori; H. Iwai

doi:https://doi.org/10.7567/SSDM.2011.E-3-1

2011 International Conference on Solid State Devices and Materials

Sep 27, 2011 - Sep 30, 2011
Aichi Industry & Labor Center (WINC AICHI), Nagoya, Japan

[E-3-1] Soft X-ray Photoelectron Spectroscopy on Chemical Bonding States of Boron Doped in Si Fin Structures

Y. Miyata¹, J. Kanehara¹, H. Nohira², Y. Izumi³, T. Muro³, T. Kinoshita³, P. Ahmet¹, K. Kakushima¹, K. Tsutsui¹, T. Hattori¹, H. Iwai¹ (1.Tokyo Tech, 2.Tokyo City Univ., 3.JASRI/SPring-8 , Japan)

https://doi.org/10.7567/SSDM.2011.E-3-1

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