Soft X-ray Photoelectron Spectroscopy on Chemical Bonding States of Boron Doped in Si Fin Structures

Y. Miyata; J. Kanehara; H. Nohira; Y. Izumi; T. Muro; T. Kinoshita; P. Ahmet; K. Kakushima; K. Tsutsui; T. Hattori; H. Iwai

doi:https://doi.org/10.7567/SSDM.2011.E-3-1

2011 International Conference on Solid State Devices and Materials

2011年9月27日〜 2011年9月30日
Aichi Industry & Labor Center (WINC AICHI), Nagoya, Japan

[E-3-1] Soft X-ray Photoelectron Spectroscopy on Chemical Bonding States of Boron Doped in Si Fin Structures

Y. Miyata¹、J. Kanehara¹、H. Nohira²、Y. Izumi³、T. Muro³、T. Kinoshita³、P. Ahmet¹、K. Kakushima¹、K. Tsutsui¹、T. Hattori¹、H. Iwai¹ (1.Tokyo Tech、2.Tokyo City Univ.、3.JASRI/SPring-8 , Japan)

https://doi.org/10.7567/SSDM.2011.E-3-1

▲