The Japan Society of Applied Physics

[E-5-2] Improvement of Thermal stability of Ni-Germanide with Ni/Co/Ni/TiN Structure for High Performance Ge MOSFETs

H. S. Shin1、S. K. Oh1、M. H. Kang1,2、H. M. Kwon1、J. Oh3、P. Majhi3、R. Jammy3、G. W. Lee1、H. D. Lee1 (1.Chungnam National Univ.、2.National NanoFab Center , Korea、3.SEMATECH , USA)

https://doi.org/10.7567/SSDM.2011.E-5-2