[E-7-3] Channel strain measurements in 32nm-node CMOSFETs

M. Takei¹、H. Hashiguchi¹、T. Yamaguchi¹、D. Kosemura¹、K. Nagata^1,2、A. Ogura¹ (1.Meiji Univ.、2.JSPS , Japan)

https://doi.org/10.7567/SSDM.2011.E-7-3