[E-7-3] Channel strain measurements in 32nm-node CMOSFETs

M. Takei¹, H. Hashiguchi¹, T. Yamaguchi¹, D. Kosemura¹, K. Nagata^1,2, A. Ogura¹ (1.Meiji Univ., 2.JSPS , Japan)

https://doi.org/10.7567/SSDM.2011.E-7-3