Characterization of strain and crystallinity in patterned embedded Silicon Germanium structures

S. Mochizuki; A. Madan; A. Pofelski; A. G. Domenicucci; P. L. Flaitz; J. Li; Y. Y. Wang; T. Pinto; C. W. Lai; J. R. Holt; E. C. T. Harley; M. W. Stoker; A. Reznicek; D. Schepis; V. Paruchuri

doi:https://doi.org/10.7567/SSDM.2011.E-7-4

[E-7-4] Characterization of strain and crystallinity in patterned embedded Silicon Germanium structures

S. Mochizuki¹、A. Madan²、A. Pofelski³、A. G. Domenicucci²、P. L. Flaitz²、J. Li²、Y. Y. Wang²、T. Pinto²、C. W. Lai⁴、J. R. Holt²、E. C. T. Harley²、M. W. Stoker²、A. Reznicek²、D. Schepis²、V. Paruchuri² (1.Renesas Electronics、2.IBM、3.STMicroelectronics、4.GLOBALFOUNDRIES Singapore , USA)

https://doi.org/10.7567/SSDM.2011.E-7-4

2011 International Conference on Solid State Devices and Materials

[E-7-4] Characterization of strain and crystallinity in patterned embedded Silicon Germanium structures