The Japan Society of Applied Physics

[F-2-3] Process Development of ALD-Rutile-TiO2/Ru(Ox) for DRAM MIMcap Application and its Leakage Mechanism Analysis

K. Tomida1、M. Popovici1、J. Swerts1、W. C. Wang2、B. Kaczer1、M. A. Pawlak1、S. Van Elshocht1、M. S. Kim1、I. Debusschere1、V. V. Afanasiev2、L. Altimime1、J. A. Kittl1 (1.imec、2.Catholic Univ. of Leuven , Belgium)

https://doi.org/10.7567/SSDM.2011.F-2-3