Mn2O3 Slurry Reuse for SiO2 Film CMP

S. Kishii; K. Nakamura; K. Hanawa; S. Watanabe; Y. Arimoto; S. Kurokawa; T. K. Doi

doi:https://doi.org/10.7567/SSDM.2011.P-2-3

2011 International Conference on Solid State Devices and Materials

2011年9月27日〜 2011年9月30日
Aichi Industry & Labor Center (WINC AICHI), Nagoya, Japan

[P-2-3] Mn₂O₃ Slurry Reuse for SiO₂ Film CMP

S. Kishii^1,3、K. Nakamura¹、K. Hanawa²、S. Watanabe¹、Y. Arimoto¹、S. Kurokawa³、T. K. Doi³ (1.Fujitsu Labs. Ltd.,、2.Showa Denko K.K.、3.Kyushu Univ. , Japan)

https://doi.org/10.7567/SSDM.2011.P-2-3

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2011 International Conference on Solid State Devices and Materials

[P-2-3] Mn2O3 Slurry Reuse for SiO2 Film CMP

[P-2-3] Mn₂O₃ Slurry Reuse for SiO₂ Film CMP