Alignment of In-plane Crystallographic Grain Orientations in Polycrystalline Si Films by Normal and Oblique-Angle Ion-Implantations

2011 International Conference on Solid State Devices and Materials

2011年9月27日〜 2011年9月30日
Aichi Industry & Labor Center (WINC AICHI), Nagoya, Japan

A. Nakajima¹、S. Kuroki²、S. Fujii²、T. Ito¹ (1.Hiroshima Univ.、2.Tohoku Univ. , Japan)