Low-loss Si waveguides with Variable-Shaped-Beam EB Lithography for Large-scaled Photonic Circuits

N. Hirayama; H. Takahashi; Y. Noguchi; M. Yamagishi; T. Horikawa

doi:https://doi.org/10.7567/SSDM.2012.A-2-2

[A-2-2] Low-loss Si waveguides with Variable-Shaped-Beam EB Lithography for Large-scaled Photonic Circuits

N. Hirayama^1,2、H. Takahashi^1,3、Y. Noguchi^1,2、M. Yamagishi^1,2、T. Horikawa^1,2 (1.Inst. for Photonics-Electronics Convergence System Tech.、2.National Inst.of Advanced Industrial Science and Tech.、3.Photonics Electronics Tech. Res. Association , Japan)

https://doi.org/10.7567/SSDM.2012.A-2-2

2012 International Conference on Solid State Devices and Materials

[A-2-2] Low-loss Si waveguides with Variable-Shaped-Beam EB Lithography for Large-scaled Photonic Circuits