The Japan Society of Applied Physics

[B-7-3] Set Voltage Statistics in Unipolar HfO2-Based RRAM

S. Long1,2, C. Cagli3, J. Buchley3, Q. Liu1, H. Lv1, X. Lian2, E. Miranda2, D. Jimenez2, M. Liu1, J. Sune2 (1.Inst. of Microelectronics, Chinese Academy of Sciences , China, 2.Universitat Autonoma de Barcelona , Spain, 3.CEA, LETI , France)

https://doi.org/10.7567/SSDM.2012.B-7-3