Highly Thermo-stable and Oriented Catalytic Metal using Co/Ir/Ta Layer Stack for Graphene Growth

M. Kitamura; Y. Yamazaki; M. Wada; T. Saito; M. Katagiri; M. Suzuki; A. Isobayashi; N. Sakuma; A. Sakata; A. Kajita; T. Sakai

doi:https://doi.org/10.7567/SSDM.2012.C-1-3

2012 International Conference on Solid State Devices and Materials

2012年9月25日〜 2012年9月27日
Kyoto International Conference Center, Kyoto, Japan

[C-1-3] Highly Thermo-stable and Oriented Catalytic Metal using Co/Ir/Ta Layer Stack for Graphene Growth

M. Kitamura¹、Y. Yamazaki¹、M. Wada¹、T. Saito¹、M. Katagiri¹、M. Suzuki¹、A. Isobayashi¹、N. Sakuma¹、A. Sakata¹、A. Kajita¹、T. Sakai¹ (1.Low-power Electronics Association &Project (LEAP) , Japan)

https://doi.org/10.7567/SSDM.2012.C-1-3

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