Highly Thermo-stable and Oriented Catalytic Metal using Co/Ir/Ta Layer Stack for Graphene Growth

M. Kitamura; Y. Yamazaki; M. Wada; T. Saito; M. Katagiri; M. Suzuki; A. Isobayashi; N. Sakuma; A. Sakata; A. Kajita; T. Sakai

doi:https://doi.org/10.7567/SSDM.2012.C-1-3

[C-1-3] Highly Thermo-stable and Oriented Catalytic Metal using Co/Ir/Ta Layer Stack for Graphene Growth

M. Kitamura¹, Y. Yamazaki¹, M. Wada¹, T. Saito¹, M. Katagiri¹, M. Suzuki¹, A. Isobayashi¹, N. Sakuma¹, A. Sakata¹, A. Kajita¹, T. Sakai¹ (1.Low-power Electronics Association &Project (LEAP) , Japan)

https://doi.org/10.7567/SSDM.2012.C-1-3

2012 International Conference on Solid State Devices and Materials

[C-1-3] Highly Thermo-stable and Oriented Catalytic Metal using Co/Ir/Ta Layer Stack for Graphene Growth