[D-2-3] Band-offset Determination at Ge/GeO2 Interface by Internal Photoemission and Charge-corrected X-ray Photo-electron Spectroscopies

W. F. Zhang^1,2、T. Nishimula^1,2、K. Nagashio^1,2、K. Kita^1,2、A. Toriumi^1,2 (1.Univ. of Tokyo、2.JST-CREST , Japan)

https://doi.org/10.7567/SSDM.2012.D-2-3