[D-5-2] Oxidation Kinetics of Ge by Oxygen Radicals at Low Temperatures and Electrical Properties of GeO2/Ge Gate Stacks

W. Song^1,2, C. H. Lee^1,2, T. Nishimura^1,2, K. Nagashio^1,2, A. Toriumi^1,2 (1.Univ. Tokyo, 2.JST-CREST , Japan)

https://doi.org/10.7567/SSDM.2012.D-5-2