[D-8-3] Tensor Evaluation of Anisotropic Stress Relaxation in Mesa-shaped SiGe Layer on Si Substrate by EBSP

M. Tomita^1,2, M. Nagasaka¹, D. Kosemura¹, K. Usuda³, T. Tezuka³, A. Ogura¹ (1.Meiji Univ., 2.Research Fellow of the Japan Society for the Promotion of Sci., 3.Green Nanoelectronics Collaborative Research Center, AIST , Japan)

https://doi.org/10.7567/SSDM.2012.D-8-3