The Japan Society of Applied Physics

[D-8-3] Tensor Evaluation of Anisotropic Stress Relaxation in Mesa-shaped SiGe Layer on Si Substrate by EBSP

M. Tomita1,2, M. Nagasaka1, D. Kosemura1, K. Usuda3, T. Tezuka3, A. Ogura1 (1.Meiji Univ., 2.Research Fellow of the Japan Society for the Promotion of Sci., 3.Green Nanoelectronics Collaborative Research Center, AIST , Japan)

https://doi.org/10.7567/SSDM.2012.D-8-3