The Japan Society of Applied Physics

[F-2-5] Suppression of off-state drain leakage current in AlGaN channel high electron mo-bility transistors on SiC substrate

T. Nanjo1、Y. Suzuki1、A. Imai1、H. Okazaki1、M. Suita1、Y. Abe1、E. Yagyu1、H. Ohji1 (1.Mitsubishi electric Corp. , Japan)

https://doi.org/10.7567/SSDM.2012.F-2-5