[F-9-5] Damage-free Neutral Beam Etching for High-performance GaN HEMT

Y. Tamura^1,3, J. Ohta^2,3, H. Fujioka^2,3, S. Samukawa^1,3 (1.Tohoku Univ., 2.The Univ. of Tokyo, 3.CREST , Japan)

https://doi.org/10.7567/SSDM.2012.F-9-5