[G-1-5] 3-Dimensional and Defect-free Etching by Neutral Beam for MEMS Applications

T. Kubota^1,2、A. Wada¹、Y. Yanagisawa¹、B. Altansukh¹、K. Miwa²、T. Ono¹、S. Samukawa^1,2 (1.Tohoku Univ.、2.BEANS , Japan)

https://doi.org/10.7567/SSDM.2012.G-1-5