[H-6-1] Development of magnetic field microscopy for interconnection testing inside passivation layer

K. Kimura¹、Y. Mima¹、N. Oyabu²、N. Kimura³、T. Inao⁴ (1.Univ. of Kobe、2.Univ. of Kyoto、3.Univ. of Osaka、4.Murata Manufacturing Company , Japan)

https://doi.org/10.7567/SSDM.2012.H-6-1