The Japan Society of Applied Physics

[I-2-2] Impact of Sn corporation on Epitaxial Growth of Ge Layers on Si(110) Substrates

S. Kidowaki1, T. Asano1, Y. Shimura1, N. Taoka1, O. Nakatsuka1, S. Zaima1 (1.Graduate School of Eng., Nagoya Univ. , Japan)

https://doi.org/10.7567/SSDM.2012.I-2-2