[I-2-2] Impact of Sn corporation on Epitaxial Growth of Ge Layers on Si(110) Substrates

S. Kidowaki¹, T. Asano¹, Y. Shimura¹, N. Taoka¹, O. Nakatsuka¹, S. Zaima¹ (1.Graduate School of Eng., Nagoya Univ. , Japan)

https://doi.org/10.7567/SSDM.2012.I-2-2