[I-2-4] Leading Wave Crystallization from Fast Moving Molten Zone Formed by Micro-Thermal-Plasma-Jet Irradiation to Amorphous Silicon Films

S. Hayashi¹、Y. Fujita¹、T. Kamikura¹、K. Sakaike¹、M. Ikeda¹、H. Hanafusa¹、S. Higashi¹ (1.Hiroshima Univ. , Japan)

https://doi.org/10.7567/SSDM.2012.I-2-4