The Japan Society of Applied Physics

[I-2-5] Low-temperature Crystallization of a-Si, a-Ge and a-Si1-xGex Films by Soft X-ray Irradiation

A. Heya1, S. Kino1, N. Matsuo1, K. Kanda2, S. Miyamoto2, S. Amano2, T. Mochizuki2, K. Toko3, T. Sadoh3, M. Miyao3 (1.Univ. of Hyogo, 2.LASTI, Univ. of Hyogo, 3.Kyushu Univ. , Japan)

https://doi.org/10.7567/SSDM.2012.I-2-5