Low-temperature Crystallization of a-Si, a-Ge and a-Si<sub>1-x</sub>Ge<sub>x</sub> Films by Soft X-ray Irradiation

A. Heya; S. Kino; N. Matsuo; K. Kanda; S. Miyamoto; S. Amano; T. Mochizuki; K. Toko; T. Sadoh; M. Miyao

doi:https://doi.org/10.7567/SSDM.2012.I-2-5

2012 International Conference on Solid State Devices and Materials

Sep 25, 2012 - Sep 27, 2012
Kyoto International Conference Center, Kyoto, Japan

[I-2-5] Low-temperature Crystallization of a-Si, a-Ge and a-Si_1-xGe_x Films by Soft X-ray Irradiation

A. Heya¹, S. Kino¹, N. Matsuo¹, K. Kanda², S. Miyamoto², S. Amano², T. Mochizuki², K. Toko³, T. Sadoh³, M. Miyao³ (1.Univ. of Hyogo, 2.LASTI, Univ. of Hyogo, 3.Kyushu Univ. , Japan)

https://doi.org/10.7567/SSDM.2012.I-2-5

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2012 International Conference on Solid State Devices and Materials

[I-2-5] Low-temperature Crystallization of a-Si, a-Ge and a-Si1-xGex Films by Soft X-ray Irradiation

[I-2-5] Low-temperature Crystallization of a-Si, a-Ge and a-Si_1-xGe_x Films by Soft X-ray Irradiation