FT-IR and TPD Analysis of Ozone-Based Atomic Layer Deposited AlOx Passivation Films for Crystalline Silicon Solar Cells

K. Arafune; S. Yamamoto; K. Urushibata; S. Miki; H. Yoshida; A. Ogura; Y. Ohshita; S. Satoh

doi:https://doi.org/10.7567/SSDM.2012.PS-15-2

[PS-15-2] FT-IR and TPD Analysis of Ozone-Based Atomic Layer Deposited AlOx Passivation Films for Crystalline Silicon Solar Cells

K. Arafune^1,4、S. Yamamoto^1,4、K. Urushibata^1,4、S. Miki^1,4、H. Yoshida^1,4、A. Ogura^2,4、Y. Ohshita^3,4、S. Satoh^1,4 (1.Univ. of Hyogo、2.Meiji Univ.、3.Toyota Tech. Inst.、4.JST-CREST , Japan)

https://doi.org/10.7567/SSDM.2012.PS-15-2

2012 International Conference on Solid State Devices and Materials

[PS-15-2] FT-IR and TPD Analysis of Ozone-Based Atomic Layer Deposited AlOx Passivation Films for Crystalline Silicon Solar Cells