Sensitization effect of 1.53 um Er3+-related emission in ErxYbyY2-x-ySiO5 crystal-line thin film fabricated by directed self-assembly using layer-by-layer deposition

F. Jing; T. Shinagawa; T. Nakajima; T. Sugawara; Y. Jiang; T. Kimura; H. Isshiki

doi:https://doi.org/10.7567/SSDM.2012.PS-7-13

[PS-7-13] Sensitization effect of 1.53 um Er3+-related emission in ErxYbyY2-x-ySiO5 crystal-line thin film fabricated by directed self-assembly using layer-by-layer deposition

F. Jing¹, T. Shinagawa¹, T. Nakajima¹, T. Sugawara², Y. Jiang², T. Kimura¹, H. Isshiki¹ (1.Univ. of Electro-Communications, 2.Shincron Co. Ltd. , Japan)

https://doi.org/10.7567/SSDM.2012.PS-7-13

2012 International Conference on Solid State Devices and Materials

[PS-7-13] Sensitization effect of 1.53 um Er3+-related emission in ErxYbyY2-x-ySiO5 crystal-line thin film fabricated by directed self-assembly using layer-by-layer deposition