[B-2-1] Low-temperature Microwave Annealing Process for Ge MOSFETs

Y.J. Lee^1,6、S.S. Chuang²、C.I. Liu³、F.K. Hsueh¹、P.J. Sung¹、C.T Wu¹、C.H. Lai⁴、Y.M. Wan³、M.I. Current⁵、T.Y. Tseng² (1.National Nano Device Lab.、2.National Chiao Tung Univ.、3.I-Shou Univ.、4.Chung Hua Univ.、5.Current Scientific、6.National Chung Hsing Univ. (Taiwan))

https://doi.org/10.7567/SSDM.2013.B-2-1