[B-2-1] Low-temperature Microwave Annealing Process for Ge MOSFETs

Y.J. Lee^1,6, S.S. Chuang², C.I. Liu³, F.K. Hsueh¹, P.J. Sung¹, C.T Wu¹, C.H. Lai⁴, Y.M. Wan³, M.I. Current⁵, T.Y. Tseng² (1.National Nano Device Lab., 2.National Chiao Tung Univ., 3.I-Shou Univ., 4.Chung Hua Univ., 5.Current Scientific, 6.National Chung Hsing Univ. (Taiwan))

https://doi.org/10.7567/SSDM.2013.B-2-1