[B-4-2] Layer-by-Layer GeO₂ Formation in the Self-Limited Oxidation Regime of Ge

C.H. Lee^1,2, T. Nishimura^1,2, T. Tabata^1,2, K. Nagashio^1,2, A. Toriumi^1,2 (1.Univ. of Tokyo, 2.JST-CREST (Japan))

https://doi.org/10.7567/SSDM.2013.B-4-2