[B-4-2] Layer-by-Layer GeO₂ Formation in the Self-Limited Oxidation Regime of Ge

C.H. Lee^1,2、T. Nishimura^1,2、T. Tabata^1,2、K. Nagashio^1,2、A. Toriumi^1,2 (1.Univ. of Tokyo、2.JST-CREST (Japan))

https://doi.org/10.7567/SSDM.2013.B-4-2