The Japan Society of Applied Physics

[E-2-5] Reduction of Charge Noise in Dual-Gate Si/SiGe Quantum Point Contact

J. Kamioka1, T. Kodera1,2,3, T. Obata2, K. Takeda2, W.M. Akhtar2, S. Tarucha2,4, S. Oda1 (1.Tokyo Tech., 2.Univ. of Tokyo, 3.PRESTO-JST, 4.RIKEN (Japan))

https://doi.org/10.7567/SSDM.2013.E-2-5