[G-6-4] Ultra Low-k Non-Porous SiOCH Film (k < 2.2) Formed by Ultra Precise Molecular Control in Polymerization Synthesis by Using Large-Radius Neutral- Beam-Enhanced CVD

Y. Kikuchi^1,3、S. Samukawa^1,2 (1.Tohoku Univ.、2.WPI-AIMR, Tohoku Univ.、3.Tokyo Electron Limited (Japan))

https://doi.org/10.7567/SSDM.2013.G-6-4