The Japan Society of Applied Physics

[M-5-2] Marked difference in structural stability between Co2FeSi/Si(111) and Co2FeAl/Si(111) heterointerfaces in post-growth annealing conditions

S. Yamada1、K. Tanikawa1、S. Oki1、M. Kawano1、M. Miyao1,2、K. Hamaya1 (1.Kyushu Univ.、2.CREST-JST (Japan))

https://doi.org/10.7567/SSDM.2013.M-5-2