The Japan Society of Applied Physics

[M-5-2] Marked difference in structural stability between Co2FeSi/Si(111) and Co2FeAl/Si(111) heterointerfaces in post-growth annealing conditions

S. Yamada1, K. Tanikawa1, S. Oki1, M. Kawano1, M. Miyao1,2, K. Hamaya1 (1.Kyushu Univ., 2.CREST-JST (Japan))

https://doi.org/10.7567/SSDM.2013.M-5-2