The Japan Society of Applied Physics

[N-6-3] Novel Silicon Surface Passivation by Al2O3/ZnO/Al2O3 Films Prepared by Atomic Layer Deposition

K.S. Jeong1, S.H. Kim1, H.R. Lee1, K.M. Han2, H.Y. Park2, H.D. Lee1, G.W. Lee1 (1.Chung-nam National Univ., 2.Solar team, DMS (Korea))

https://doi.org/10.7567/SSDM.2013.N-6-3